Applications

Digital Controllers

RZ series

Temperature and level management of chemical solution
■Temperature and level management of chemical solution
In the etching and cleaning processes of semiconductor manufacturing, highly corrosive chemical solution is used. To measure temperature and level of such chemical solution, highly corrosive resistant sensors are used.

RB series

Temperature control of incubators
■Temperature control of incubators
Temperature set point can be switched over using external contact input according to the object to be warmed.

SA200

Temperature control of incubators
■Temperature control of incubators
Temperature set point can be switched over using external contact input according to the object to be warmed.

FZ series

Rapid Thermal Process (RTP) like Lamp annealing
■Rapid Thermal Process (RTP) like Lamp annealing
When temperature rises rapidly, a controller with fast sampling and an output device with fast response need to be used.
Cascade temperature control in diffusion furnace
■Cascade temperature control in diffusion furnace
If there is a large time lag between the controlled object and the heat source, the cascade control could be suitable. The control output from the primary controller (Master) is input into the secondary controller (Slave). The secondary controller conducts temperature control of the heat source while correcting the temperature setpoint with the control output from the primary controller. Cascade control can be achieved with a single FZ400/FZ900.
Melt pressure control of extruders
■Melt pressure control of extruders
RPM of main motor is controlled to maintain constant melt pressure (discharge rate).
Highly accurate temperature control of T-die
■Highly accurate temperature control of T-die
Enables highly accurate temperature control using power controllers. Use of Automatic temperature rise function* of SRZ enables a uniform temperature rise in the T-die. * Function to increase the temperature of all zones at the same rate.
Temperature control with suppression of external disturbance when ingredients are put in
■Temperature control with suppression of external disturbance when ingredients are put in
Temperature rapidly goes down when ingredients are put in the cooking machine. To minimize this temperature change, appropriate control of heater is necessary.
Optimum control of parching machine using control with PV select
■Optimum control of parching machine using control with PV select
Temperature of the controlled object is automatically switched (from in-the-pot temperature to foodstuff temperature)
Cascade temperature control of autoclave
■Cascade temperature control of autoclave
The temperature of the slave (heat source) is controlled to maintain a proper temperature of the master (sterilized target).
Control with PV select in High temperature firing furnace application
■Control with PV select in High temperature firing furnace application
Input 1 and Input 2 are automatically switched at the preset temperature. For example, a thermocouple is used in the lower temperature range, and a radiation thermometer is used in the higher temperature range, which are switched between each other at the preset point.

FB series

Ratio temperature control of continuous furnace (Link operation)
■Ratio temperature control of continuous furnace (Link operation)
Temperature program control of each zone is conducted with the preset ratio.

HA930

Melt pressure control of extruders
■Melt pressure control of extruders
RPM of main motor is controlled to maintain constant melt pressure (discharge rate).